Controlling the Photo-Degradation Rate Constant of PS Containing Nickel(II) Complex

Authors

  • Zainab Hussain Department of Chemistry, College of Science, Misan University, Misan-Iraq.
  • Raghda Alsayed Department of Chemistry, College of Science, Al-Nahrain University, Baghdad-Iraq.
  • Atheel Alwash Department of Chemistry, College of Science, Al-Nahrain University, Baghdad, Iraq.
  • Ahmed Ahmed Polymer Research Unit, College of Science, Al-Mustansiryah University, Baghdad-Iraq.
  • Riyadh Noaman Chemical and Petrochemical Research Center, Corporation of Research and Industrial Development, Ministry of Industry and Minerals, Baghdad-Iraq.
  • Ali H Jawad Faculty of Applied Sciences, Universiti Teknologi MARA, Shah Alam, Selangor, Malaysia.
  • Emad Yousif Department of Chemistry, College of Science, Al-Nahrain University, Baghdad, Iraq.

Keywords:

Ni(II) complex, PS, Photochemistry, photodegradation

Abstract

The complex of Ni(II) metal with 4-amino-5-(pyridyl)-4H-1,2,4-triazole-3-thiol was used as a polystyrene (PS) films photostabilizer. The PS films comprising concentrating of complex 0.5% w\w were outputted by casting method from chloroform solvent. The photostabilization activities of PS films compounds with dissimilar thickness were identified by computing the photodegradation rate constant (kd) for blank and modified polystyrene. From the practical consequences obtained, a mechanism was proposed count on the installation of the complex. The PS films were irradiated utilizing a 365 nm wavelength light source with intensity 6.02  10-9 Ein dm-3 s-1 at room temperature.

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Published

2019-09-01

Issue

Vol. 22 No. 3 (2019): September

Section

Articles

How to Cite

[1]
“Controlling the Photo-Degradation Rate Constant of PS Containing Nickel(II) Complex”, ANJS, vol. 22, no. 3, pp. 8–17, Sep. 2019, Accessed: Apr. 19, 2024. [Online]. Available: https://anjs.edu.iq/index.php/anjs/article/view/2156

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